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- [22] New resist technologies for 0.25-mu m wiring pattern fabrication with KrF lithography JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1997, 36 (4A): : 2085 - 2090
- [23] Double exposure technology for KrF lithography EMLC 2008: 24TH EUROPEAN MASK AND LITHOGRAPHY CONFERENCE, 2008, 6792
- [24] Performance of 1 kHz KrF excimer laser for DUV lithography XI INTERNATIONAL SYMPOSIUM ON GAS FLOW AND CHEMICAL LASERS AND HIGH-POWER LASER CONFERENCE, 1997, 3092 : 467 - 470
- [28] THE METHOD OF MEASURING OPTICAL-PERFORMANCE IN KRF EXCIMER LITHOGRAPHY JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1992, 31 (12B): : 4167 - 4173
- [29] A NEW PHOTOBLEACHABLE POSITIVE RESIST FOR KRF EXCIMER LASER LITHOGRAPHY JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1988, 27 (11): : L2219 - L2222