KrF excimer lithography eyed for 0.25μm device technology

被引:0
|
作者
Anon
机构
来源
JEE. Journal of electronic engineering | 1995年 / 32卷 / 348期
关键词
Semiconductor device manufacture;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] Lithography Technology Using a KrF Excimer Laser
    Yamaguchi, A.
    Nakao, S.
    Wakamiya, W.
    Mitsubishi Denki Giho, 71 (03):
  • [2] Standing wave effect of various illumination methods in 0.25 μm KrF excimer laser lithography
    NEC Corp, Kanagawa, Japan
    Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, 12 B (6560-6564):
  • [3] Advances in excimer laser technology for sub-0.25-μm lithography
    Das, P
    Sandstrom, RL
    PROCEEDINGS OF THE IEEE, 2002, 90 (10) : 1637 - 1652
  • [4] Standing wave effect of various illumination methods in 0.25 mu m KrF excimer laser lithography
    Uchiyama, T
    Shioiri, S
    Hashimoto, T
    Kasama, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (12B): : 6560 - 6564
  • [5] KrF lithography for 0.25-μm CMOS/SIMOX pattern fabrication
    NTT System Electronics Lab, Japan
    NTT R&D, 4 (379-386):
  • [6] Fabrication of 0.2 μm hole patterns in KrF excimer laser lithography
    Asano, Masafumi
    Kawano, Kenji
    Tanaka, Satoshi
    Onishi, Yasunobu
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1997, 36 (5 A): : 2640 - 2641
  • [7] KrF lithography for 0.25-mu m CMOS/SIMOX pattern fabrication
    Kawai, Y
    Ohtaka, A
    Nakamura, J
    Tanaka, A
    NTT REVIEW, 1997, 9 (04): : 96 - 104
  • [8] NEW TECHNOLOGIES OF KRF EXCIMER-LASER LITHOGRAPHY SYSTEM IN 0.25 MICRON COMPLEX CIRCUIT PATTERNS
    SASAGO, M
    MATSUO, T
    YAMASHITA, K
    ENDO, M
    MATSUOKA, K
    KOIZUMI, T
    KATSUYAMA, A
    NOMURA, N
    IEICE TRANSACTIONS ON ELECTRONICS, 1994, E77C (03) : 416 - 424
  • [9] Fabrication of 0.2 mu m hole patterns in KrF excimer laser lithography
    Asano, M
    Kawano, K
    Tanaka, S
    Onishi, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (5A): : 2640 - 2641
  • [10] Aberration effects in the region of 0.18 mu m lithography with KrF excimer stepper
    Yim, DY
    Lim, CM
    Kim, HS
    Baik, KH
    OPTICAL MICROLITHOGRAPHY X, 1997, 3051 : 714 - 723