Stainless-steel-AlN cermet selective surfaces deposited by direct current magnetron sputtering technology

被引:0
|
作者
Univ of Sydney, Sydney [1 ]
机构
来源
Sol Energ Mater Sol Cells | / 1-2卷 / 95-106期
关键词
Number:; -; Acronym:; Usyd; Sponsor: University of Sydney;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [31] Oxidation behavior of copper nitride thin films deposited by direct current magnetron sputtering
    Perumal Devaraj
    Pazhanisami Peranantham
    Yekkoni Lakshmanan Jeyachandran
    Journal of Materials Science: Materials in Electronics, 2021, 32 : 27899 - 27912
  • [32] Thin films hydrogenated silicon deposited by direct current magnetron sputtering at high rate
    Cherfi, R.
    Farhi, G.
    Aoucher, M.
    Solid State Phenomena, 1999, 67 : 113 - 118
  • [33] Structure and properties of Ta/TaOx barrier films deposited by direct current magnetron sputtering
    Zhou, Y. M.
    Xie, Z.
    Xiao, H. N.
    Hu, P. F.
    He, J.
    VACUUM, 2009, 84 (02) : 330 - 334
  • [34] Structure and tribological behavior of (AlCrNbSiTiV)N film deposited using direct current magnetron sputtering and high power impulse magnetron sputtering
    Chang, Chun-Hao
    Yang, Ching-Been
    Sung, Chia-Chi
    Hsu, Chun-Yao
    THIN SOLID FILMS, 2018, 668 : 63 - 68
  • [35] β-Ta and α-Cr thin films deposited by high power impulse magnetron sputtering and direct current magnetron sputtering in hydrogen containing plasmas
    Hogberg, Hans
    Tengdelius, Lina
    Samuelsson, Mattias
    Jensen, Jens
    Hultman, Lars
    PHYSICA B-CONDENSED MATTER, 2014, 439 : 3 - 8
  • [36] Comparison of microstructures and magnetic properties in FePt alloy films deposited by direct current magnetron sputtering and high power impulse magnetron sputtering
    Yang, Wen-Sheng
    Sun, Ta-Huang
    Chen, Sheng-Chi
    Jen, Shien-Uang
    Guo, Han-Jie
    Liao, Ming-Han
    Chen, Jiann-Ruey
    JOURNAL OF ALLOYS AND COMPOUNDS, 2019, 803 : 341 - 347
  • [37] Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering
    Benegra, M
    Lamas, DG
    de Rapp, MEF
    Mingolo, N
    Kunrath, AO
    Souza, RM
    THIN SOLID FILMS, 2006, 494 (1-2) : 146 - 150
  • [38] Study on selective absorber coatings of Cr/Cr2O3 cermet deposited by DC magnetron sputtering
    School of Opto-Electronic Engineering, Xi'an Technological University, Xi'an 710032, China
    不详
    Zhenkong Kexue yu Jishu Xuebao, 2006, 6 (517-521):
  • [39] Effect of sputtering pressure on the properties of large area IWO thin films deposited by direct current magnetron sputtering
    Yu, Tianyu
    Jiang, Yunlei
    Liang, Suxia
    Zhao, Zhiguo
    Zou, Sheng
    Su, Jie
    Hua, Renjie
    Liang, Cang
    Chen, Wangfan
    Zhang, Mi
    Zhang, Wenjun
    Shi, Lei
    Dong, Yuan
    CURRENT APPLIED PHYSICS, 2024, 64 : 1 - 7
  • [40] Highly Durable Antimicrobial Tantalum Nitride/Copper Coatings on Stainless Steel Deposited by Pulsed Magnetron Sputtering
    Elangovan, Thangavel
    Balasankar, Athinarayanan
    Arokiyaraj, Selvaraj
    Rajagopalan, Ramaseshan
    George, Rani P.
    Oh, Tae Hwan
    Kuppusami, Parasuraman
    Ramasundaram, Subramaniyan
    MICROMACHINES, 2022, 13 (09)