ACID COPPER BATH FOR THROUGH-HOLE PLATING.

被引:0
|
作者
Bindra, P.
David, A.
Galasco, R.
Light, D.N.
Varsik, J.
York, E.
机构
来源
IBM technical disclosure bulletin | 1983年 / 26卷 / 04期
关键词
COPPER PLATING;
D O I
暂无
中图分类号
学科分类号
摘要
This acid copper bath has a high throwing power suitable for through-hole plating in printed circuit boards. The acid copper plating bath contains copper sulfate, free sulfuric acid, chloride ions and an organic additive of the polyglycol family with a molecular weight greater than 600 g/mole.
引用
收藏
页码:2173 / 2176
相关论文
共 50 条
  • [1] OPTIMIZATION OF AN ACID COPPER BATH FOR THROUGH-HOLE PLATING
    BARRINGER, T
    CARANO, M
    PLATING AND SURFACE FINISHING, 1986, 73 (03): : 36 - 37
  • [2] FACTORS WHICH AFFECT OUTGASSING AND HOLE-WALL ADHESION IN THROUGH-HOLE PLATING.
    Favini, Carlo
    Whitlaw, Keith
    Product Finishing (London), 1988, 41 (07): : 11 - 15
  • [3] THROUGH-HOLE COPPER PLATING FOR THE PRINTED CIRCUIT INDUSTRY.
    Anon
    1600, (26):
  • [4] Through-Hole Filling in a Cu Plating Bath with Functional Insoluble Anodes and Acetic Acid as a Supporting Electrolyte
    Lin, Yu-Tien
    Wang, Mei-Ling
    Hsu, Chia-Fu
    Dow, Wei-Ping
    Lin, Shih-Min
    Yang, Jian-Jun
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2013, 160 (12) : D3149 - D3153
  • [5] THE EFFECT OF ADDITIVES IN ELECTROLESS BATH ON ELECTROPLATED THROUGH-HOLE FROM COPPER PYROPHOSPHATE BATH
    BOLCH, T
    KOVAC, Z
    WERNER, I
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (8B) : C439 - C439
  • [6] IMPROVEMENTS IN THROUGH-HOLE PLATING TECHNOLOGY
    BACH, W
    KUKANSKIS, P
    PLATING AND SURFACE FINISHING, 1987, 74 (02): : 47 - 47
  • [7] IMPROVEMENTS IN THROUGH-HOLE PLATING TECHNOLOGY
    BACH, W
    KUKANSKIS, P
    PLATING AND SURFACE FINISHING, 1987, 74 (05): : 40 - 40
  • [8] Influence of additives and pulse parameters on uniformity of through-hole copper plating
    Wang, Z. X.
    Wang, S.
    Yang, Z.
    Wang, Z. L.
    TRANSACTIONS OF THE INSTITUTE OF METAL FINISHING, 2010, 88 (05): : 272 - 276
  • [9] LOOK AT THE DEPOSIT DISTRIBUTION IN ACID COPPER PLATING.
    Ramamurthy, S.
    Parthasaradhy, N.V.
    Journal of the Electrochemical Society of India, 1985, 34 (03): : 220 - 225
  • [10] Improved Uniformity of Conformal Through-Hole Copper Electrodeposition by Revision of Plating Cell Configuration
    Ji, Linxian
    Wang, ShouXu
    Wang, Chong
    Chen, Guoqin
    Chen, Yuanming
    He, Wei
    Tan, Ze
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2015, 162 (12) : D575 - D583