Formation of highly dispersed molybdenum silicides in radio frequency inductively coupled nitrogen plasma

被引：0
|
作者：
机构：
来源：
Latvijas Kimijas Zhurnal | / 1卷 / 54期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] Spheroidization of a granulated molybdenum powder by radio frequency inductively coupled plasma
    Hao, Zhenhua
    Fu, Zhenhua
    Liu, Jintao
    Zhu, Xingying
    Zhou, Fa
    Shu, Yongchun
    Yi, Jianhong
    He, Jilin
    INTERNATIONAL JOURNAL OF REFRACTORY METALS & HARD MATERIALS, 2019, 82 : 15 - 22
  • [2] The inductively coupled radio frequency plasma
    Boulos, MI
    HIGH TEMPERATURE MATERIAL PROCESSES, 1997, 1 (01): : 17 - 39
  • [3] Striations in a radio frequency planar inductively coupled plasma
    Stittsworth, JA
    Wendt, AE
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 1996, 24 (01) : 125 - 126
  • [4] Striations in a radio frequency planar inductively coupled plasma
    Univ of Wisconsin-Madison, Madison, United States
    IEEE Trans Plasma Sci, 1 (125-126):
  • [5] THE INDUCTIVELY COUPLED RF (RADIO-FREQUENCY) PLASMA
    BOULOS, MI
    PURE AND APPLIED CHEMISTRY, 1985, 57 (09) : 1321 - 1352
  • [6] Inductively coupled radio frequency methane plasma simulation
    Bera, K
    Farouk, B
    Vitello, P
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2001, 34 (10) : 1479 - 1490
  • [7] SYMMETRIC AND ASYMMETRIC DOUBLE LANGMUIR PROBES CHARACTERIZATION OF RADIO FREQUENCY INDUCTIVELY COUPLED NITROGEN PLASMA
    Naz, M. Y.
    Ghaffar, A.
    Rehman, N. U.
    Azam, M.
    Shukrullah, S.
    Qayyum, A.
    Zakaullah, M.
    PROGRESS IN ELECTROMAGNETICS RESEARCH-PIER, 2011, 115 : 207 - 221
  • [8] Enhanced radio frequency field penetration in an inductively coupled plasma
    Tuszewski, M
    PHYSICAL REVIEW LETTERS, 1996, 77 (07) : 1286 - 1289
  • [9] Transition phenomena in a radio-frequency inductively coupled plasma
    Abdel-Rahman, M.
    Gathen, V. Schulz-von der
    Gans, T.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2007, 40 (06) : 1678 - 1683
  • [10] Transient Response of Radio Frequency Inductively Coupled Plasma for Pulse Modulation
    K. C. Paul
    J. Mostaghimi
    T. Ishigaki
    T. Sakuta
    Plasma Chemistry and Plasma Processing, 2001, 21 : 371 - 400
12345