Oxidation of amorphous NiZr sputtered films

被引:0
|
作者
Cochrane, R.W. [1 ]
Huai, Y. [1 ]
McManus, M.K. [1 ]
Sacher, E. [1 ]
机构
[1] Univ de Montreal, Montreal, Canada
关键词
Glass; Metallic - Oxidation - Metallography - Sputtering - Surface Phenomena;
D O I
暂无
中图分类号
学科分类号
摘要
In this study the surface oxidation of a number of nickel-rich NiZr alloys is reported as a means to determine its role on the stability of amorphous zirconium-based metallic glasses. The evolution of the oxide layer was monitored by following the nickel and zirconium XPS peaks after exposure to an oxygen pressure of 10-5 mbar for various periods. The surface of the air-exposed films is characterized as ZrO2 even for bulk nickel concentrations over 80 at.%. After sputter cleaning, oxidation at room temperature under controlled oxygen exposure results in a several-stage oxidation towards ZrO2 accompanied by a systematic depletion of the nickel at the surface. This reaction saturates after exposures of the order of several thousand Langmuirs. Throughout this process, nickel remains primarily in a metallic state. There is, moreover, indirect transport evidence that a non-surface nickel-rich layer is produced.
引用
收藏
页码:1021 / 1024
相关论文
共 50 条
  • [21] Lithium insertion in sputtered amorphous molybdenum thin films
    IFGW Unicamp, Campinas, Brazil
    Solid State Ionics, pt 2 (977-981):
  • [22] Studies on the RF sputtered amorphous SiGe thin films
    M. Serényi
    T. Lohner
    Z. Zolnai
    P. Petrik
    Á. Nemcsics
    N. Q. Khánh
    P. Turmezei
    Inorganic Materials, 2006, 42 : 3 - 6
  • [23] Growth mechanism of sputtered amorphous silicon thin films
    Abdesselem, S
    Aida, MS
    Attaf, N
    Ouahab, A
    PHYSICA B-CONDENSED MATTER, 2006, 373 (01) : 33 - 41
  • [24] On the delamination dynamic of sputtered amorphous carbon nitride films
    Peponas, S.
    Benlahsen, M.
    Guedda, M.
    JOURNAL OF APPLIED PHYSICS, 2009, 106 (01)
  • [25] Optical properties of reactively sputtered TeOx amorphous films
    Pietralunga, SM
    D'Amore, F
    Zappettini, A
    APPLIED OPTICS, 2005, 44 (04) : 534 - 537
  • [26] Perpendicular magnetic anisotropy in sputtered amorphous TbFeCo films
    Liu, X.
    Morisako, A.
    Sakurai, H.
    Sakurai, Y.
    Itou, M.
    Koizumi, A.
    JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 2007, 310 (02) : 1744 - 1746
  • [27] Lithium insertion in sputtered amorphous molybdenum thin films
    Gorenstein, A
    Scarminio, J
    Lourenco, A
    SOLID STATE IONICS, 1996, 86-8 : 977 - 981
  • [28] Insights on the deposition mechanism of sputtered amorphous carbon films
    Logothetids, S
    Gioti, M
    Patsalas, P
    Charitidis, C
    CARBON, 1999, 37 (05) : 765 - 769
  • [29] Oxidation of sputtered AlScN films exposed to the atmosphere
    Li, Minghua
    Hu, Kan
    Lin, Huamao
    Felmetsger, Valery
    Zhu, Yao
    2022 IEEE INTERNATIONAL ULTRASONICS SYMPOSIUM (IEEE IUS), 2022,
  • [30] THE ROLE OF SURFACE IN SPUTTERED AMORPHOUS-SILICON - AN OXIDATION STUDY
    CUTRERA, M
    GENNARO, AM
    BATTIONI, M
    KOROPECKI, RR
    DEBERNARDEZ, LS
    ARCE, R
    BUITRAGO, R
    JOURNAL OF APPLIED PHYSICS, 1985, 58 (11) : 4251 - 4255