High rate process for depositing nanostructured oxide films and coatings

被引：0
|
作者：
Anon
机构：
来源：
Materials Technology | 1998年 / 13卷 / 04期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Nanostructured materials
引用
收藏
页码：149 / 152
相关论文
共 50 条
  • [41] Wetting Characteristics on Micro/Nanostructured Zinc Oxide Coatings
    Kuan, C. Y.
    Hon, M. H.
    Chou, J. M.
    Leu, I. C.
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2009, 156 (02) : J32 - J36
  • [42] Nanostructured niobium oxide coatings influence osteoblast adhesion
    Eisenbarth, E.
    Velten, D.
    Mueller, M.
    Thull, R.
    Breme, J.
    JOURNAL OF BIOMEDICAL MATERIALS RESEARCH PART A, 2006, 79A (01) : 166 - 175
  • [43] Plasma-assisted deposition of nanostructured films and coatings
    Girshick, SL
    HIGH TEMPERATURE MATERIAL PROCESSES, 2000, 4 (03): : 379 - 384
  • [44] Novel ALD process for depositing CaF2 thin films
    Pilvi, Tero
    Arstila, Kai
    Leskela, Markku
    Ritala, Mikko
    CHEMISTRY OF MATERIALS, 2007, 19 (14) : 3387 - 3392
  • [45] Effect of Rare Earth Elements on Depositing Rate of Nickel Alloy Brush Plating Coatings
    黄锦滨
    朱宝亮
    刘家浚
    孙冬柏
    俞宏英
    杨德钧
    JournalofRareEarths, 2000, (03) : 215 - 218
  • [46] Application of dip-coating process for depositing conducting polypyrrole films
    Khedkar, SP
    Radhakrishnan, S
    THIN SOLID FILMS, 1997, 303 (1-2) : 167 - 172
  • [47] Effect of rare earth elements on depositing rate of nickel alloy brush plating coatings
    Huang, JB
    Zhu, BL
    Liu, JJ
    Sun, DB
    Yu, HY
    Yang, DJ
    JOURNAL OF RARE EARTHS, 2000, 18 (03) : 215 - 218
  • [48] Nucleation of biocompatible nanostructured coatings via electrochemical process
    Mali, S. A.
    MATERIALS TECHNOLOGY, 2012, 27 (04) : 284 - 288
  • [49] Effect of rare earth elements on depositing rate of nickel alloy brush plating coatings
    Huang, Jinbin
    Zhu, Baoliang
    Liu, Jiajun
    Sun, Dongbai
    Yu, Hongying
    Yang, Dejun
    2000, Chinese Rare Earth Society, China (18):
  • [50] Nanostructured oxide films by ferrite plating with sonochemistry
    Department of Physical Electronics, Tokyo Institute of Technology, Meguro-ku, Tokyo, 152-8552, Japan
    Nanostruct Mater, 1 (41-44):
12345