XPS study of XeCl excimer-laser-etched InP

被引：0
|
作者：
Wrobel, Jerzy M. [1 ]
Moffitt, Christopher E. [1 ]
Wieliczka, David M. [1 ]
Dubowski, Jan J. [1 ]
Fraser, Jeffrey W. [1 ]
机构：
[1] Univ of Missouri-KC, Kansas City, United States
来源：
Applied Surface Science | 1998年 / 127-129卷
关键词：
Number:; -; Acronym:; MU; Sponsor: University of Missouri;
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页码：805 / 809
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