PRODUCTION Mev ION IMPLANTERS FOR ENERGIES FROM 200 Kev TO 4 Mev.

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作者：
Rathmell, R.D. [1 ]
Norton, G.A. [1 ]
机构：
[1] Natl Electrostatics Corp, Middleton,, WI, USA, Natl Electrostatics Corp, Middleton, WI, USA
来源：
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms | 1986年 / B21卷 / 2-4期
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5
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页码：270 / 273
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