COMPUTER SIMULATION OF THE ION SPUTTER PROFILING PROCESS.

被引：0

作者：

Qu, Zhe ^{[1
]}

Xie, Tiansheng ^{[1
]}

机构：

[1] Acad Sinica, Shenyang, China, Acad Sinica, Shenyang, China

来源：

Jinshu Xuebao/Acta Metallurgica Sinica | 1986年 / 22卷 / 05期

关键词：

D O I：

暂无

中图分类号：

学科分类号：

摘要：

SPUTTERING

引用

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