In Situ measurements of the resist etch rate for submicron patterns

被引：0
|
作者：
Kawata, Hiroaki [1 ]
Fukuda, Hiroyoshi [1 ]
Matsunaga, Takashi [1 ]
Yasuda, Masaaki [1 ]
Murata, Kenji [1 ]
机构：
[1] Dept. of Physics and Electronics, College of Engineering, Osaka Prefecture University, 1-1 Gakuencho, Sakai, Osaka 599-8531, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1999年 / 38卷 / 7 B期
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页码：4478 / 4482
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