Nanotopography Impact and Non-Prestonian Behavior of Ceria Slurry in Shallow Trench Isolation Chemical Mechanical Polishing (STI-CMP)

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作者：
Katoh, Takeo [1 ]
Kim, Min-Seok [1 ]
Paik, Ungyu [2 ]
Park, Jea-Gun [1 ]
机构：
[1] Nano-SOI Process Laboratory, Hanyang University, 17 Haengdang-Dong, Seoungdong-Gu, Seoul 133-791, Korea, Republic of
[2] Department of Ceramic Engineering, Hanyang University, 17 Haengdang-Dong, Seoungdong-Gu, Seoul 133-791, Korea, Republic of
来源：
Japanese Journal of Applied Physics, Part 2: Letters | 2004年 / 43卷 / 2 A期
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