Deposition of thin TiN films by low-power reactive magnetron sputtering

被引：0
|
作者：
Mikhal'chuk, P.V. [1 ]
Orlikovsky, A.A. [1 ]
Vasiliev, A.G. [1 ]
Lebedev, O.I. [2 ]
Zakharov, D.N. [2 ]
机构：
[1] Institute of Physics and Technology, Russian Academy of Sciences, Krasikova str., 25A, Moscow 117218, Russia
[2] Inst. of Crystallography, Russian Academy of Sciences, Leninskii pr.50, Moscow 117333, Russia
来源：
Vide: Science, Technique et Applications | 1997年 / 53卷 / 283 SUPPL.期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：143 / 145
相关论文
共 50 条
  • [1] COMPARISON OF REACTIVE DEPOSITION OF TIN FILMS BY MAGNETRON SPUTTERING AND ARC EVAPORATION
    VYSKOCIL, J
    MUSIL, J
    KADLEC, S
    MUNZ, WD
    PLASMA SURFACE ENGINEERING, VOLS 1 AND 2, 1989, : 661 - 668
  • [2] Deposition of aluminium oxide thin films by reactive magnetron sputtering
    Koski, K
    Hölsä, J
    Juliet, P
    SURFACE & COATINGS TECHNOLOGY, 1999, 116 : 716 - 720
  • [3] DEPOSITION OF ALN THIN-FILMS BY MAGNETRON REACTIVE SPUTTERING
    GEROVA, EV
    IVANOV, NA
    KIROV, KI
    THIN SOLID FILMS, 1981, 81 (03) : 201 - 206
  • [4] Kinetic properties of TiN thin films prepared by reactive magnetron sputtering
    M. N. Solovan
    V. V. Brus
    P. D. Maryanchuk
    T. T. Kovalyuk
    J. Rappich
    M. Gluba
    Physics of the Solid State, 2013, 55 : 2234 - 2238
  • [5] Preparation and Properties of TiN Thin Films by DC Reactive Magnetron Sputtering
    Shan Yu-qiao
    Gu Xun-lei
    Wang You-xin
    MULTI-FUNCTIONAL MATERIALS AND STRUCTURES II, PTS 1 AND 2, 2009, 79-82 : 2275 - 2278
  • [6] Kinetic properties of TiN thin films prepared by reactive magnetron sputtering
    Solovan, M. N.
    Brus, V. V.
    Maryanchuk, P. D.
    Kovalyuk, T. T.
    Rappich, J.
    Gluba, M.
    PHYSICS OF THE SOLID STATE, 2013, 55 (11) : 2234 - 2238
  • [7] ADHESION OF THIN TIN FILMS PREPARED BY REACTIVE DC MAGNETRON SPUTTERING
    MUSIL, J
    POULEK, V
    DUSEK, V
    CZECHOSLOVAK JOURNAL OF PHYSICS, 1984, 34 (06) : 597 - 600
  • [8] TiN-Fenanocomposite thin films deposited by reactive magnetron sputtering
    Zerkout, S.
    Achour, S.
    Tabet, N.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2007, 40 (23) : 7508 - 7514
  • [9] Deposition by magnetron sputtering and characterization of indium tin oxide thin films
    Mudryi, A. V.
    Ivaniukovich, A. V.
    Ulyashin, A. G.
    THIN SOLID FILMS, 2007, 515 (16) : 6489 - 6492
  • [10] THIN TIN FILMS OBTAINED BY RF MAGNETRON SPUTTERING AND REACTIVE ION-BEAM ASSISTED DEPOSITION
    GUZMAN, L
    ELENA, M
    GIACOMOZZI, F
    ASTURIZAGA, O
    NARSALE, AM
    KOTHARI, DC
    PLASMA SURFACE ENGINEERING, VOLS 1 AND 2, 1989, : 995 - 1002
12345