Modified GaSe crystals for mid-IR applications

被引：0
|
作者：
Singh, N.B. [1 ]
Suhre, D.R. [1 ]
Rosch, W. [1 ]
Meyer, R. [1 ]
Marable, M. [1 ]
Fernelius, N.C. [1 ]
Hopkins, F.K. [1 ]
Zelmon, D.E. [1 ]
Narayanan, R. [1 ]
机构：
[1] Northrop Grumman Corp, Pittsburgh, United States
来源：
Journal of Crystal Growth | 1999年 / 198-199卷 / pt 1期
关键词：
Number:; -; Acronym:; AFRL; Sponsor: Air Force Research Laboratory;
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页码：588 / 592
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