CNx film characterization by surface sensitive methods: XPS and XAES

被引：0
|
作者：
Dementjev, A.P. [1 ]
de Graaf, A. [1 ]
Dolgiy, D.I. [1 ]
Olshanski, E.D. [1 ]
Shulga, Y.M. [1 ]
Serov, A.A. [1 ]
机构：
[1] RRC Kurchatov Inst, Moscow, Russia
来源：
Diamond and Related Materials | 1999年 / 8卷 / 02期
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页码：601 / 604
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