Contact angle and atomic force microscopy study of reactions of n-alkyltrichlorosilanes with Muscovite micas exposed to water vapor plasmas with various power densities

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作者：
Nakagawa, Tohru [1 ]
Soga, Mamoru [1 ]
机构：
[1] Matsushita Electric Industrial Co, Ltd, Osaka, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1997年 / 36卷 / 11期
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页码：6915 / 6921
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  • [1] Contact angle and atomic force microscopy study of reactions of n-alkyltrichlorosilanes with muscovite micas exposed to water vapor plasmas with various power densities
    Nakagawa, T
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    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (11): : 6915 - 6921
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