Nanoscale SiO2 particles placed upon the crystalline silicon

被引：0
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作者：
Zavodinsky, V.G. [1 ]
Kuyanov, I.A. [1 ]
机构：
[1] Inst for Automation and Control, Processes Far Eastern Branch of the, Russian Acad of Sciences, Vladivostok, Russia
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1996年 / 35卷 / 08期
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页码：4285 / 4290
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