Depth profiling of Na in SiOx films by combination of chemical etching and secondary ion mass spectrometry

被引：0
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作者：
Saito, Reiko [1 ]
Kudo, Masahiro [1 ]
机构：
[1] Toshiba Corp, Yokohama, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1998年 / 37卷 / 02期
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页码：690 / 694
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