Wide-area uniform plasma processing in an ECR plasma

被引：0
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作者：
Hiyama, Shin [1 ]
Ono, Takashi [1 ]
Iizuka, Satoru [1 ]
Sato, Noriyoshi [1 ]
机构：
[1] Kokusai Electric Corp, Sendai, Japan
来源：
Plasma Sources Science and Technology | 1996年 / 5卷 / 02期
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页码：299 / 304
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