Lattice disorder and behavior of implanted atoms in In-implanted TiO2 (rutile)

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作者
Nakamura, Shiho [1 ]
Yagi, Eiichi [1 ]
Osaka, Toshiaki [1 ]
Iwaki, Masaya [1 ]
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[1] Inst of Physical & Chemical, Research, Japan
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The authors express their gratitude to Mr T. Kobayashi; Mr Y. Okabe and Mr T. Urai for their technical assistance. The present research was partially supported by the Ministry of Education; Science and Culture; Japan;
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页码:729 / 733
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