USE OF ION IMPLANTATION IN FUTURE GaAs TECHNOLOGY.

被引：0
|
作者：
Stephens, K.G.
Sealy, B.J.
机构：
来源：
Solar Energy | 1978年 / 9卷 / 02期
关键词：
Compendex;
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摘要：
SEMICONDUCTING GALLIUM COMPOUNDS
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页码：13 / 18
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