Optical design of high-performance beam lines for X-ray lithography

被引：0
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作者：
Toyota, Eijiro [1 ]
机构：
[1] Sumitomo Heavy Industries, Ltd., 2-1-1, Yato-cho, Tanashi, Tokyo 188-8585, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1999年 / 38卷 / 6 A期
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页码：3513 / 3521
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