Ultraviolet/ozone cleaning

被引:0
|
作者
机构
来源
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [31] A STUDY OF THE USE OF ULTRAVIOLET OZONE CLEANING FOR REDUCTION OF THE DEFECT DENSITY ON MOLECULAR-BEAM EPITAXY GROWN GAAS WAFERS
    KOPF, RF
    KINSELLA, AP
    EBERT, CW
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (01): : 132 - 135
  • [32] Thermal desorption spectroscopy and molecular-beam time-of-flight studies of silicon wafer ultraviolet/ozone cleaning
    Yamaguchi, K
    Uematsu, Y
    Ikoma, Y
    Watanabe, F
    Motooka, T
    Igarashi, T
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (02): : 277 - 281
  • [33] Ultraviolet Powder versus Ultraviolet Gel for Assessing Environmental Cleaning
    Munoz-Price, L. Silvia
    Fajardo-Aquino, Yovanit
    Arheart, Kristopher L.
    INFECTION CONTROL AND HOSPITAL EPIDEMIOLOGY, 2012, 33 (02): : 192 - 195
  • [34] Ultraviolet light for coil cleaning in schools
    ASHRAE
    不详
    不详
    Eng syst, 2006, 3 (50-60+95):
  • [35] SURFACE CLEANING BY ULTRAVIOLET-RADIATION
    SOWELL, RR
    CUTHRELL, RE
    MATTOX, DM
    BLAND, RD
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01): : 474 - 475
  • [36] OZONE ULTRAVIOLET PHOTOLYSIS .6. ULTRAVIOLET-SPECTRUM
    SIMONS, JW
    PAUR, RJ
    WEBSTER, HA
    BAIR, EJ
    JOURNAL OF CHEMICAL PHYSICS, 1973, 59 (03): : 1203 - 1208
  • [37] Chemical cleaning of ceramic ultrafiltration membranes - Ozone versus conventional cleaning chemicals
    Alresheedi, Mohammad T.
    Basu, Onita D.
    Barbeau, Benoit
    CHEMOSPHERE, 2019, 226 : 668 - 677
  • [38] Surface cleaning aluminum foil with ozone gas
    Momose, T
    Hayasaka, E
    Saitou, K
    Nagayama, K
    Abe, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (03): : 961 - 963
  • [39] UV-OZONE CLEANING OF GAAS FOR MBE
    MCCLINTOCK, JA
    WILSON, RA
    BYER, NE
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (02): : 241 - 242
  • [40] Precision cleaning without ozone depleting chemicals
    Kanegsberg, B
    CHEMISTRY & INDUSTRY, 1996, (20) : 787 - 791