Photo-oxidation of germanium nanostructures deposited by the cluster-beam evaporation technique

被引:0
|
作者
机构
来源
J Appl Phys | / 3卷 / 1518期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [21] Electron transport in Ge nanocrystalline films deposited using the cluster beam evaporation technique
    Banerjee, S
    Nozaki, S
    Morisaki, H
    JOURNAL OF APPLIED PHYSICS, 2002, 91 (07) : 4307 - 4311
  • [22] Size-selective measurements of silicon-cluster polarizabilities by a cluster-beam deflection technique
    Woenckhaus, J
    Schafer, R
    Becker, JA
    SURFACE REVIEW AND LETTERS, 1996, 3 (01) : 371 - 375
  • [23] PHOTO-OXIDATION OF POLY(VINYL CHLORIDE) INVESTIGATED BY A STRESS RELAXATION TECHNIQUE
    COX, WC
    CRAWFORD, DJ
    PEILL, PLD
    JOURNAL OF APPLIED POLYMER SCIENCE, 1970, 14 (03) : 611 - &
  • [24] Properties of CdS films deposited by the electron beam evaporation technique
    Sivaramamoorthy, K.
    Bahadur, S. Asath
    Kottaisamy, M.
    Murali, K. R.
    JOURNAL OF ALLOYS AND COMPOUNDS, 2010, 503 (01) : 170 - 176
  • [25] Formation of semimagnetic semiconductor superlattices by ionized cluster-beam technique and their quantum-size effects
    Koyanagi, T
    Ohmoto, H
    Matsubara, K
    Anno, H
    SURFACE REVIEW AND LETTERS, 1996, 3 (01) : 1033 - 1038
  • [26] Cluster Study of the Photo-Oxidation of Water on Rutile Titanium Dioxide (TiO2)
    Valdes, A.
    Kroes, G-J.
    JOURNAL OF PHYSICAL CHEMISTRY C, 2010, 114 (03): : 1701 - 1708
  • [27] Photo-amorphization and photo-oxidation of As50Se50 thin films deposited onto silicon substrates
    Universidad de Cadiz, Cadiz, Spain
    Mater Lett, 1-4 (157-161):
  • [28] Photo-amorphization and photo-oxidation of As50Se50 thin films deposited onto silicon substrates
    Prieto-Alcon, R
    Gonzalez-Leal, JM
    Bernal-Oliva, AM
    Marquez, E
    MATERIALS LETTERS, 1998, 36 (1-4) : 157 - 161
  • [29] OBLIQUELY DEPOSITED GERMANIUM SELENIDE FILMS PHOTO AND ION-BEAM INDUCED CONTRACTION
    VENKATESAN, T
    WILKENS, B
    FISHER, K
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (03) : C97 - C97
  • [30] Thin titanium oxide films deposited by e-beam evaporation or by sputtering technique with additional rapid thermal oxidation
    de Barros, A. D.
    Doi, I.
    Swart, J. W.
    Diniz, J. A.
    2014 29TH SYMPOSIUM ON MICROELECTRONICS TECHNOLOGY AND DEVICES (SBMICRO), 2014,