Preparation of BN films by r.f. thermal plasma chemical vapour deposition

被引:0
|
作者
Natl Inst for Research in Inorganic, Materials, Tsukuba-shi, Japan [1 ]
机构
来源
J Mater Sci | / 3卷 / 713-720期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [41] Plasma-enhanced chemical vapour deposition of amorphous Se films
    Nagels, P.
    Sleeckx, E.
    Callaerts, R.
    Journal De Physique, 1995, 5 (06): : 5 - 1109
  • [42] Piezoelectric ZnO films by r.f. sputtering
    Molarius, J
    Kaitila, J
    Pensala, T
    Ylilammi, M
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2003, 14 (5-7) : 431 - 435
  • [43] Piezoelectric ZnO films by r.f. sputtering
    J. Molarius
    J. Kaitila
    T. Pensala
    M. Ylilammi
    Journal of Materials Science: Materials in Electronics, 2003, 14 : 431 - 435
  • [44] Effect of a r.f. antenna on carbon nitride films deposited by ionized r.f. magnetron sputtering
    Angleraud, B
    Mubumbila, N
    Tessier, R
    DIAMOND AND RELATED MATERIALS, 2003, 12 (3-7) : 1093 - 1097
  • [45] Atomic hydrogen concentration mapping in thermal plasma chemical vapour deposition
    J. Larjo
    J. Walewski
    R. Hernberg
    Applied Physics B, 2001, 72 : 455 - 464
  • [46] Atomic hydrogen concentration mapping in thermal plasma chemical vapour deposition
    Larjo, J
    Walewski, J
    Hernberg, R
    APPLIED PHYSICS B-LASERS AND OPTICS, 2001, 72 (04): : 455 - 464
  • [47] Preparation of silicon oxide films by ultraviolet-assisted rf plasma-enhanced chemical vapour deposition
    Hozumi, A
    Sugimoto, N
    Sekoguchi, H
    Takai, O
    JOURNAL OF MATERIALS SCIENCE LETTERS, 1997, 16 (10) : 860 - 862
  • [48] Synthesis of thick and high quality cubic boron nitride films by r.f. bias assisted d.c. jet plasma chemical vapor deposition
    Yu, J
    Matsumoto, S
    DIAMOND AND RELATED MATERIALS, 2004, 13 (09) : 1704 - 1708
  • [49] Plasma substrate interaction effects on composition and chemical structure of reactively r.f. magnetron sputtered carbon nitride films
    Kaltofen, R
    Sebald, T
    Schulte, J
    Weise, G
    THIN SOLID FILMS, 1999, 347 (1-2) : 31 - 38
  • [50] Internal r.f. plasma parameters correlated with structure and properties of deposited hydrocarbon films
    Hallil, A
    Despax, B
    THIN SOLID FILMS, 2000, 358 (1-2) : 30 - 39