Influence of deposition rate and relative parameters on properties of TiO2 thin films prepared by DC reactive magnetron sputtering

被引：0
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作者：
Zhang, Yongxi
Shen, Jie
Yang, Xiliang
Chen, Huaxian
Lu, Ming
Yan, Xuejian
Zhang, Zhuangjian
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来源：
Zhenkong Kexue yu Jishu Xuebao/Vacuum Science and Technology | 2000年 / 20卷 / 01期
关键词：
Crystal structure - Deposition - Magnetron sputtering - Refractive index - Titanium dioxide;
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摘要：
Titanium dioxide films were grown on glass substrates by DC reactive magnetron sputtering. The influence of various growth parameters on the optical properties and structures of the films was studied. The results show that the refractive index of the film is almost independent of the deposition rate and oxygen argon ratio, but the surface morphology changes distinctly. The X-ray diffraction patterns show that if the oxygen argon ratio is 1:9, there are some grains of TiOx (x2 layers were also given.
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页码：13 / 18
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