RESISTIVITY OF THIN METAL FILMS.

被引：0

作者：

Chaurasia, H.K.

Voss, W.A.G.

机构：

来源：

| 1600年 / MTT-2期

关键词：

FILMS; -; Metallic;

D O I：

10.1109/tmtt.1973.1127915

中图分类号：

学科分类号：

摘要：

It is shown that the sheet resistance, and hence the resistivity, of metal films less than 100 A thick can be determined conveniently and accurately by microwave measurements. Accuracy is limited by VSWR measurement, film-holder design, and short-circuit quality. Dc and microwave resistivity measurements are given for gold films on cleaved mica.

引用

共 50 条

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1600, (27):
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CHAURASIA, HK
VOSS, WAG
IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, 1973, MT21 (01) : 51 - 52
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IBM technical disclosure bulletin, 1983, 26 (3 A): : 925 - 926
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IEEE Transactions on Magnetics, 1986, MAG-23 (02)

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