共 50 条
- [21] Criteria for low damage III-V dry etching COMPOUND SEMICONDUCTOR POWER TRANSISTORS AND STATE-OF-THE-ART PROGRAM ON COMPOUND SEMICONDUCTORS (SOTAPOCS XXIX), 1998, 98 (12): : 213 - 221
- [22] Ion etching effects at interfaces of semiconductor III-V/III-V and II-VI/III-V heterostructures in SIMS depth profiling Electron Technology (Warsaw), 1996, 29 (2-3): : 277 - 282
- [25] Photoresist-free microstructuring of III-V semiconductors with laser-assisted dry etching ablation LASERS AS TOOLS FOR MANUFACTURING OF DURABLE GOODS AND MICROELECTRONICS, 1996, 2703 : 405 - 410
- [26] In situ monitoring of sapphire nanostructure etching using optical emission spectroscopy JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2023, 41 (06):
- [28] A new optical sensor for real time in-situ enpoint monitoring during dry etching of III-V ternary multi stack layers PROCESS, EQUIPMENT, AND MATERIALS CONTROL IN INTEGRATED CIRCUIT MANUFACTURING V, 1999, 3882 : 300 - 308
- [29] Plasma Etching Process Monitoring with Optical Emission Spectroscopy 2009 INTERNATIONAL CONFERENCE ON INDUSTRIAL MECHATRONICS AND AUTOMATION, 2009, : 45 - 47
- [30] Computer simulation of optical confinement in III-V nitride double heterostructures SILICON CARBIDE AND RELATED MATERIALS 1995, 1996, 142 : 1007 - 1010