共 50 条
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- [3] IMPROVED EPITAXIAL LAYER DESIGN FOR REAL-TIME MONITORING OF DRY-ETCHING IN III-V COMPOUND HETEROSTRUCTURES WITH DEPTH ACCURACY OF +/-8 NM JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1994, 12 (04): : 1973 - 1977
- [4] NANOSCALE STRUCTURES IN III-V SEMICONDUCTORS USING SIDEWALL MASKING AND HIGH ION DENSITY DRY-ETCHING JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (03): : 753 - 757
- [9] HIGH-RESOLUTION DRY-ETCHING OF III-V SEMICONDUCTOR-MATERIALS USING MAGNETICALLY ENHANCED DISCHARGES MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1994, 27 (01): : 61 - 68
- [10] Deep in situ dry-etch monitoring of III-V multilayer structures using laser reflectometry and reflectivity modeling JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2002, 20 (03): : 748 - 753