Simulation of thermal processes in the resist in direct electron lithography

被引：0
|
作者：
Kapaev, V.V. [1 ]
Smolyanitskij, I.Ya. [1 ]
机构：
[1] Moskovskij Inst Elektronnoj Tekhniki, Moscow, Russia
来源：
Mikroelektronika | 1994年 / 23卷 / 01期
关键词：
Heat diffusion - Heat flow - Resist surface - Resists;
D O I：
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中图分类号：
学科分类号：
摘要：
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页码：11 / 20
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