AMORPHOUS SILICON FILMS BY IONIZED CLUSTER BEAM METHOD.

被引：0
|
作者：
Kudo, Jun [1 ]
Iguchi, Katsuji [1 ]
Hara, Teruyoshi [1 ]
Kawamura, Akio [1 ]
Seki, Akinori [1 ]
Koba, Masayoshi [1 ]
Awane, Katsunobu [1 ]
机构：
[1] Sharp Corp, LSI Research Lab Jpn, Sharp Corp, LSI Research Lab Jpn
来源：
Shapu Giho/Sharp Technical Journal | 1985年 / 31期
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摘要：
6
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页码：43 / 48
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