High pressure high power microwave plasma chemical vapor deposition of large area diamond films

被引：0
|
作者：
Naseem, H.A. [1 ]
Haque, M.S. [1 ]
Khan, M.A. [1 ]
Malshe, A.P. [1 ]
Brown, W.D. [1 ]
机构：
[1] Univ of Arkansas, Fayetteville, United States
来源：
Thin Solid Films | 1997年 / 308-309卷
关键词：
Number:; MDA972-93-1-0036; Acronym:; DARPA; Sponsor: Defense Advanced Research Projects Agency;
D O I：
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页码：141 / 146
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