Effects of resist thickness and thin-film interference in I-line and deep ultraviolet optical lithography

被引：0
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作者：
Xiao, Jiabei [1 ]
Garofalo, Joseph [1 ]
Cirelli, Raymond [1 ]
Vaidya, Sheila [1 ]
机构：
[1] AT&T Bell Lab, Murray Hill, United States
来源：
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | 1995年 / 13卷 / 06期
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页码：2897 / 2903
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