Resistless electron beam lithography process for the fabrication of sub-50 nm silicide structures

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作者：
Drouin, D.
Beauvais, J.
Lavallee, E.
Michel, S.
Mouine, J.
Gauvin, R.
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Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena | 1997年 / 15卷 / 06期
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