Application of Raman spectrometry for the characterization of complex oxide thin films grown by MOCVD

被引：0
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作者：
Güttler, B. [1 ]
Gorbenko, O.Yu. [2 ]
Novozhilov, M.A. [2 ]
Samoilenkov, S.V. [2 ]
Amelichev, V.A. [2 ]
Wahl, G. [3 ]
Zandbergen, H.W. [4 ]
机构：
[1] PTB, Bundesallee 100, 38116 Braunschweig, Germany
[2] Chemistry Department, Moscow State University, 119899 Moscow, Russia
[3] IOPW, TU Braunschweig, 38108 Braunschweig, Germany
[4] National Center for HREM, TU Delft, Rotterdamseweg 137, AL Delft, Netherlands
来源：
Journal De Physique. IV : JP | 1999年 / 9 pt 2卷 / 08期
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页码：8 / 1179
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