Deep 3-D structures produced by soft x-ray lithography

被引:0
|
作者
Dance, Brian
机构
来源
Semiconductor International | 1997年 / 20卷 / 06期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:217 / 218
相关论文
共 50 条
  • [21] Reflectivity test of X-ray mirrors for deep X-ray lithography
    V. Nazmov
    E. Reznikova
    A. Last
    M. Boerner
    J. Mohr
    Microsystem Technologies, 2008, 14 : 1299 - 1303
  • [22] Reflectivity test of X-ray mirrors for deep X-ray lithography
    Nazmov, V.
    Reznikova, E.
    Last, A.
    Boerner, M.
    Mohr, J.
    MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2008, 14 (9-11): : 1299 - 1303
  • [23] X-ray microfabrication of multi-level structures and 3-D patterning
    Morris, KJ
    Vladimirsky, Y
    Vladimirsky, O
    Calderon, G
    MICROELECTRONIC ENGINEERING, 1997, 35 (1-4) : 545 - 548
  • [24] X-ray microfabrication of multi-level structures and 3-D patterning
    Morris, K.J.
    Vladimirsky, Y.
    Vladimirsky, O.
    Calderon, G.
    1997, Elsevier Science B.V., Amsterdam, Netherlands (35) : 1 - 4
  • [25] Method for accurately shape-prediction of 3-D structure fabricated by X-ray lithography
    Horade, A
    Khumpuang, S
    Sugiyama, S
    Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems II, 2005, 5650 : 418 - 428
  • [26] 3-D X-ray images of nanoparticles
    不详
    AMERICAN CERAMIC SOCIETY BULLETIN, 2007, 86 (02): : 27 - 27
  • [27] Quantitative 3-D imaging of eukaryotic cells using soft X-ray tomography
    Parkinson, Dilworth Y.
    McDermott, Gerry
    Etkin, Laurence D.
    Le Gros, Mark A.
    Larabell, Carolyn A.
    JOURNAL OF STRUCTURAL BIOLOGY, 2008, 162 (03) : 380 - 386
  • [28] Microbeam X-ray Lithography Apparatus for Direct Production of Deep LIGA Structures
    Gol'denberg, B. G.
    Reznikova, E. F.
    Lemzyakov, A. G.
    Pindyurin, V. F.
    OPTOELECTRONICS INSTRUMENTATION AND DATA PROCESSING, 2013, 49 (01) : 81 - 86
  • [29] Influence of developer temperature on the shape of structures fabricated by deep X-ray lithography
    Mitsuhiro Horade
    Susumu Sugiyama
    Microsystem Technologies, 2013, 19 : 357 - 362
  • [30] Validation of X-ray lithography and development simulation system for moving mask deep X-ray lithography
    Hirai, Y
    Hafizovic, S
    Matsuzuka, N
    Korvink, JG
    Tabata, O
    JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, 2006, 15 (01) : 159 - 168