Overlay accuracy evaluation in step-and-repeat X-ray lithography

被引：0
|
作者：
Deguchi, Kimiyoshi [1 ]
Komatsu, Kazuhiko [1 ]
Horiuchi, Toshiyuki [1 ]
Hirata, Kazuo [1 ]
机构：
[1] NTT LSI Lab, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1988年 / 27卷 / 07期
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D O I：
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学科分类号：
摘要：
Lithography
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页码：1275 / 1280
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