Dielectric and electrical characteristics of titanium-modified Ta2O5 thin films deposited on nitrided polysilicon by metalorganic chemical vapor deposition

被引：0
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作者：
Chang, Chich Shang [1 ]
Wu, Tai Bor [1 ]
Shih, Wong Cheng [2 ]
Chao, Lan Lin [2 ]
机构：
[1] Dept. of Mat. Sci. and Engineering, National Tsing Hua University, 101, Sec. 2, Hsinchu 300, Taiwan
[2] Vanguard Intl. Semiconduct. Corp., Science-Based Industrial Park, 123, Park Ave-3rd, Hsinchu, 30077, Taiwan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1999年 / 38卷 / 12 A期
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页码：6812 / 6816
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