Wettability of polished silicon oxide surfaces

被引：0
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作者：
Thomas, Richard R. [1 ]
Kaufman, Frank B. [1 ]
Kirleis, Juergen T. [1 ]
Belsky, Richard A. [1 ]
机构：
[1] E.I. DuPont de Nemours and Co, Deepwater, United States
来源：
| 1996年 / Electrochemical Soc Inc, Pennington, NJ, United States卷 / 143期
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摘要：
38
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