Damage formed on silicon surface by helicon wave plasma etching

被引：0
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作者：
Hara, Tohru [1 ]
Kawaguchi, Kazu [1 ]
Hayashi, Jun [1 ]
Nogami, Hiroshi [1 ]
Tsukada, Tsutomu [1 ]
机构：
[1] Hosei Univ, Tokyo, Japan
来源：
Japanese Journal of Applied Physics, Part 2: Letters | 1993年 / 32卷 / 4 A期
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