STRUCTURE OF SPUTTERED a-Si1 - XCX FILMS.

被引：0
|
作者：
Inoue, Shozo [1 ]
Suzaki, Yoshifumi [1 ]
Yoshii, Kumayasu [1 ]
Kawabe, Hideaki [1 ]
机构：
[1] Osaka Univ, Suita, Jpn, Osaka Univ, Suita, Jpn
来源：
Nippon Kinzoku Gakkai-si | 1987年 / 51卷 / 01期
关键词：
AMORPHOUS SILICON CARBIDE FILMS - ATOMIC STRUCTURE - DIFFRACTION - REFLECTION HIGH ENERGY ELECTRON DIFFRACTION - SURFACE STRUCTURE;
D O I：
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摘要：
(Edited Abstract)
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页码：12 / 17
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