STRUCTURE OF SPUTTERED a-Si1 - XCX FILMS.

被引：0

作者：

Inoue, Shozo ^{[1
]}

Suzaki, Yoshifumi ^{[1
]}

Yoshii, Kumayasu ^{[1
]}

Kawabe, Hideaki ^{[1
]}

机构：

[1] Osaka Univ, Suita, Jpn, Osaka Univ, Suita, Jpn

来源：

Nippon Kinzoku Gakkai-si | 1987年 / 51卷 / 01期

关键词：

AMORPHOUS SILICON CARBIDE FILMS - ATOMIC STRUCTURE - DIFFRACTION - REFLECTION HIGH ENERGY ELECTRON DIFFRACTION - SURFACE STRUCTURE;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

(Edited Abstract)

引用

页码：12 / 17

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