HOPPING CONDUCTION IN SiO2 FILMS THERMALLY GROWN ON PHOSPHORUS-DOPED POLYCRYSTALLINE SILICON.

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作者：
Krause, H. [1 ]
Schell, M. [1 ]
Golinsky, H.-Chr. [1 ]
机构：
[1] Technische Hochschule Ilmenau,, Sektion Physik und Technik, Elektronischer Bauelemente, Ilmenau,, Technische Hochschule Ilmenau, Sektion Physik und Technik Elektronischer Bauelemente, Ilmenau, East
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| 1600年 / 85期
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摘要：
SEMICONDUCTING SILICON
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