Plated Metallic Films Obtained by Ion Deposition.

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作者：
Brothier, A.
Rolland, C.
Rigat, H.
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Vide | 1979年 / 34卷 / 196期
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摘要：
The necessity to obtain a thick, uniform coating on substrates of various configuration led to the development of an ion-plating deposition system using an electron beam evaporation source. For materials such as Al, Sm, Y and W, the coatings answer the need for quality at thicknesses between 80 and 2,000 mu m.
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页码：109 / 111
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