Triode magnetron sputtering TiN film deposition

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作者：
Fontana, L.C. [1 ]
Muzart, J.L.R. [1 ]
机构：
[1] UDESC/FEJ, Joinville, Brazil
来源：
Surface and Coatings Technology | 1999年 / 114卷 / 01期
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页码：7 / 12
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