Sulfonamide-phenolic resin negative resist for KrF excimer laser lithography

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[1] Yamaoka, Tsuguo
[2] Nishiki, Masashi
[3] Jin, Shun Ji
[4] Kitamura, Jun
[5] Koseki, Ken'ichi
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Yamaoka, Tsuguo | 1600年 / 28期
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