Dry Etching in Microelectronics: New Techniques for the Future Needs.

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作者：
Prud'Homme, Danielle [1 ]
机构：
[1] EFCIS, Grenoble, Fr, EFCIS, Grenoble, Fr
来源：
Vide, les Couches Minces | 1983年 / 38卷 / 218期
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