LASER PROCESSING IN SILICON MICROELECTRONICS TECHNOLOGY.

被引:0
|
作者
Leamy, H.J.
机构
关键词
D O I
暂无
中图分类号
学科分类号
摘要
Laser irradiation may effect either thermal or chemical changes in target materials. A brief review of the mechanisms involved and a summary assessment of their potential for application in silicon microelectronics technology is presented.
引用
收藏
页码:112 / 117
相关论文
共 50 条
  • [31] Adaptation of microelectronics simulator to the polycrystalline silicon technology
    Gaillard, T
    Lhermite, H
    Bonnaud, O
    Rogel, R
    SOLID STATE PHENOMENA, 1999, 67-8 : 131 - 136
  • [32] Laser Assisted Microstructuring of Amorphous Silicon for Microelectronics
    Halim, M. M.
    Abdolvand, A.
    Fan, Y.
    Persheyev, S. K.
    Main, C.
    Rafailov, E. U.
    Rose, M. J.
    2010 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO) AND QUANTUM ELECTRONICS AND LASER SCIENCE CONFERENCE (QELS), 2010,
  • [33] Laser tunning silicon microdevices for analog microelectronics
    École Polytechnique de Montréal, Département de Génie Physique, Case Postale 6079, succ. Centre-Ville, Montréal
    QC
    H3C 3A7, Canada
    不详
    QC
    H3C 3A7, Canada
    不详
    QC
    H7V 4B4, Canada
    Proc SPIE Int Soc Opt Eng, 1600, (205-207):
  • [34] SOME NEW LASER PROCESSING APPLICATIONS IN MICROELECTRONICS
    PARKER, DL
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1983, 385 : 24 - 29
  • [35] PRESENT STATUS OF SEMICONDUCTOR LASER TECHNOLOGY.
    Kamigawa, Mitsuo
    JEE, Journal of Electronic Engineering, 1982, 19 (189): : 106 - 109
  • [36] PROSPECTIVE OF APPLICATION OF LASER, ELECTRON-BEAM AND INCOHERENT LIGHT PROCESSING TO SEMICONDUCTOR TECHNOLOGY.
    Lietoila, Arto
    Physica B: Physics of Condensed Matter & C: Atomic, Molecular and Plasma Physics, Optics, 1982, 117-118 (Pt II): : 1017 - 1020
  • [37] SILICON SENSORS LEAD PRESSURE TRANSMITTER TECHNOLOGY.
    Buchy, Frank
    Chilton's instruments & control systems, 1987, 60 (02): : 37 - 39
  • [38] Laser technology targets microelectronics defect detection
    Seaton, C
    PHOTONICS SPECTRA, 2003, 37 (08) : 74 - +
  • [39] TRENDS IN ION IMPLANTATION IN SILICON VLSI TECHNOLOGY.
    Tokuyama, Takashi
    Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 1986, B19-20 : 299 - 306
  • [40] LASER-BEAM TECHNOLOGY FOR MICROELECTRONICS INDUSTRY
    WHITEHOUSE, DR
    IIGENFRI.RW
    SOLID STATE TECHNOLOGY, 1972, 15 (07) : 32 - +