Oxidation state of Fe and Ti ions implanted in yttria-stabilized zirconia studied by XPS

被引：0

作者：

van Hassel, B.A. ^{[1
]}

Burggraaf, A.J. ^{[1
]}

机构：

[1] Univ of Twente, Enschede, Netherlands

来源：

Applied Physics A: Solids and Surfaces | 1991年 / 52卷 / 06期

关键词：

Depth Profiling - Iron Implantation - Oxidation State - Titanium Implantation - X-Ray Photoelectron Spectroscopy - Yttria Stabilized Zirconia;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

The oxidation state of Fe and Ti ions implanted in yttria stabilized zirconia (YSZ) was studied by XPS (X-ray photoelectron spectroscopy) in combination with depth profiling using Ar+ sputtering. In the 'as-implanted' state of the sample Fe was found to be present as Fe3+, Fe2+ and as metallic Fe0. This is in agreement with earlier conversion electron Mossbauer Spectroscopy measurements. For Ti-implanted YSZ in the 'as-implanted' state the majority of the Ti is present as Ti4+, Ti3+, and Ti2+ ions, while a part of the Zr cations is present in the divalent oxidation state (Zr2+). After oxidation in air, the Fe and Ti ions are present only in the valence three and four oxidation states, respectively.

引用

页码：410 / 417

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