Formation kinetics and infrared absorption of carbon-oxygen complexes in czochralski silicon

被引：0

作者：

Yamanaka, Hideki ^{[1
]}

机构：

[1] Huls Japan, Ltd, Utsunomiya, Japan

来源：

| 1600年 / JJAP, Minato-ku, Japan卷 / 33期

关键词：

Silicon;

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暂无

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学科分类号：

摘要：

引用

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[1] FORMATION KINETICS AND INFRARED-ABSORPTION OF CARBON-OXYGEN COMPLEXES IN CZOCHRALSKI SILICON
YAMANAKA, H
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[2] CARBON-OXYGEN COMPLEXES AS NUCLEI FOR THE PRECIPITATION OF OXYGEN IN CZOCHRALSKI SILICON
OEHRLEIN, GS
LINDSTROM, JL
CORBETT, JW
APPLIED PHYSICS LETTERS, 1982, 40 (03) : 241 - 243
[3] VIBRATIONAL ABSORPTION OF CARBON AND CARBON-OXYGEN COMPLEXES IN SILICON
NEWMAN, RC
SMITH, RS
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1969, 30 (06) : 1493 - &
[4] Nitrogen-oxygen complexes and carbon-oxygen complexes in silicon
Peidong, L.
Siming, S.
Jinxing, S.
Zhaoxu, G.
Chaoqun, P.
Ping, D.
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[5] Oxygen aggregation kinetics, thermal donors and carbon-oxygen defect formation in silicon containing carbon and tin
Angeletos, T.
Sgourou, E. N.
Andrianakis, A.
Diamantopoulou, A.
Chroneos, A.
Londos, C. A.
JOURNAL OF APPLIED PHYSICS, 2015, 118 (01)
[6] ANNEALING BEHAVIOR OF CARBON-OXYGEN COMPLEXES IN SILICON-CRYSTALS OBSERVED BY LOW-TEMPERATURE INFRARED-ABSORPTION
SHIRAKAWA, Y
YAMADAKANETA, H
MORI, H
JOURNAL OF APPLIED PHYSICS, 1995, 77 (01) : 41 - 46
[7] INFRARED-ABSORPTION STUDY ON CARBON AND OXYGEN BEHAVIOR IN CZOCHRALSKI SILICON-CRYSTALS
SHIMURA, F
BAIARDO, JP
FRAUNDORF, P
APPLIED PHYSICS LETTERS, 1985, 46 (10) : 941 - 943
[8] Role of carbon-oxygen complexes in the carbon-oxygen reaction mechanism.
Skokova, K
Radovic, LR
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1996, 211 : 27 - FUEL
[9] STUDIES IN FORMATION AND PROPERTIES OF CARBON-OXYGEN SURFACE COMPLEXES .4. CHEMISORPTION KINETICS OF OXYGEN ON CHARCOAL AND NATURE OF COMPLEXES FORMED
PURI, BR
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JOURNAL OF THE INDIAN CHEMICAL SOCIETY, 1971, 48 (06) : 513 - &
[10] Infrared absorption of Czochralski germanium and silicon
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Ownby, PD
Poznich, CR
Richter, JC
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INORGANIC OPTICAL MATERIALS III, 2001, 4452 : 17 - 24

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